Samsung Electronics and ASML Expand Strategic Collaboration for Next-Generation Semiconductor Manufacturing

What happened

With High NA EUV, the transition to larger, 12-inch masks is expected to further increase fab productivity, lower chipmaking costs and remove stitching constraints. High NA EUV is expected to extend the DRAM scaling roadmap, with improved resolution enabling process simplification and increased efficiency.

The semiconductor industry has relied on the 6-inch photomask format for decades. Drawing on its leadership in both memory and foundry manufacturing, as well as its extensive experience with advanced EUV lithography, Samsung is positioned to play a critical role in the 12-inch photomask transition.

ASML is a leading supplier to the semiconductor industry. The company provides chipmakers with hardware, software and services to mass produce the patterns of integrated circuits (microchips).

Key facts

• The company — provides: chipmakers with hardware, software and services to mass produce the patterns of integrated circuits (microchips)