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Deterministic Nucleation Enables Controlled Growth of 2D Semiconductors (KAIST, TDS, Hanyang et al.)
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首次报道 来源：Semiconductor Engineering最近编辑更新
What happened
Deterministic Nucleation Enables Controlled Growth of 2D Semiconductors (KAIST, TDS, Hanyang et al.), according to Semiconductor Engineering. Researchers at KAIST, TDS Innovation, Hanyang University, UNIST, et al. published a technical paper titled “Spatially deterministic nucleation of 2D semiconductors by etching flux.”
Spatially deterministic nucleation of 2D semiconductors by etching flux. The post Deterministic Nucleation Enables Controlled Growth of 2D Semiconductors (KAIST, TDS, Hanyang et al.) appeared first on Semiconductor Engineering .
来源与证据
- Semiconductor Engineering 报道来源
Deterministic Nucleation Enables Controlled Growth of 2D Semiconductors (KAIST, TDS, Hanyang et al.) ↗
https://semiengineering.com/deterministic-nucleation-enables-controlled-growth-of-2d-semiconductors-kaist-tds-hanyang-et-al/